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Photolithographic system:

ABM Double Side Alignment System

- Resolution: 0.5μm

- Top side alignment accuracy: 1μm

- Backside visible alignment accuracy: 2μm

- Substrate: up to 6" wafer

Karl Suss MA4 Mask Aligner

- Resolution: 1μm

- IR backside alignment

- Substrate: up to 4" wafer